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Ultraviolet optical properties and Structural characteristics of RF-deposited HfO2 thin films
RongdunHong
Author NameAffiliationE-mail
RongdunHong Department of Physics, Xiamen University, Xiamen, 361005, People’s Republic of China suncz@stu.xmu.edu.cn 
Abstract:
Hafnium oxide (HfO2) thin films were deposited on quartz substrate by radio frequency magnetron sputtering with power from 160 W to 240 W. The optical and microstructural properties of samples before and after annealing were characterized by XRD, XPS, UV-VIS-NIR spectrophotometer and ellipsometer. The results show optical transmittances with low absorption in wavelength range above λ=200nm for all samples. The appropriate annealing can transfer the amorphous state of as-deposited films to the crystal film, contribute to the growth of nanocrystalline and compressive stress, optimize the stoichiometry of the film and systematically improve film density and the refractive index. In consideration of the stability of proper refractive index (>2) and high optical transmittance in UV band, HfO2 films deposited approximately at 220 W can be used in UV anti-reflection system.
Key words:  Thin films  Optical materials  Sputtering  X-ray diffraction
FundProject:
Ultraviolet optical properties and Structural characteristics of RF-deposited HfO2 thin films
RongdunHong
摘要:
Hafnium oxide (HfO2) thin films were deposited on quartz substrate by radio frequency magnetron sputtering with power from 160 W to 240 W. The optical and microstructural properties of samples before and after annealing were characterized by XRD, XPS, UV-VIS-NIR spectrophotometer and ellipsometer. The results show optical transmittances with low absorption in wavelength range above λ=200nm for all samples. The appropriate annealing can transfer the amorphous state of as-deposited films to the crystal film, contribute to the growth of nanocrystalline and compressive stress, optimize the stoichiometry of the film and systematically improve film density and the refractive index. In consideration of the stability of proper refractive index (>2) and high optical transmittance in UV band, HfO2 films deposited approximately at 220 W can be used in UV anti-reflection system.
关键词:  Thin films  Optical materials  Sputtering  X-ray diffraction
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