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Plasma Treatment Enhanced Magnetic Properties in Manganese Doped Titanium Nitride Thin Films
Dan Li,Ling-ming Xu,Shu-wei Li,Xun Zhou*
Author NameAffiliationE-mail
Dan Li   
Ling-ming Xu   
Shu-wei Li   
Xun Zhou*  hbkfy@gznu.edu.cn 
Abstract:
The ferromagnetic manganese doped TiN films were grown by plasma assisted molecular beam epitaxy on MgO(001) substrates. The nitrogen concentration and the ratio of manganese at Ti lattice sites increase after the plasma annealing post treatment. TiN(002) peak shifts toward low angle direction and TiN(111) peak disappears after the post treatment. The lattice expansion and peak shift are mainly ascribed to the reduction of nitrogen vacancies in films. The magnetism was suppressed in as-prepared sample due to the pinning effect of the nitrogen vacancies at defect sites or interface. The magnetism can be activated by the plasma implantation along with nitrogen vacancies reduce. The decrease of nitrogen vacancies leads to the enhancement of ferromagnetism.
Key words:  Epitaxial growth  Magnetic materials  Thin films  Solar energy materials
FundProject:This work is supported by the Science and Technology Cooperation Plan of Guizhou Province (JLKS[2013]15),the 2012 Doctor Foundation of Guizhou Normal University of China (Xun Zhou) Scholars of Ministry of Education of China,Ph.D.Programs Foundation of Ministry of Education of China (No.20120171120011),the Open Fund of the State Key Laboratory on Integrated Optoelectronics of Jilin University (No.IOKL2013KF14),the National Natural Science Foundation of China (No.61273310).
等离子辅助后处理对锰掺杂氮化钛薄膜磁特性的影响
李丹,许灵敏,李树玮,周勋*
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DOI:10.1063/1674-0068/30/cjcp1703045
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