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Computer Simulation of Thin Film Wrinkling on Elastic Substrate
Qian-ru Lv,Hua-ping Li,Cong-hua Lu,Xue-hao He
Author NameAffiliationE-mail
Qian-ru Lv Department of Chemistry, School of Science, Tianjin University, and Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China;Department of Polymer Science and Engineering, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China  
Hua-ping Li Department of Chemistry, School of Science, Tianjin University, and Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China;Department of Polymer Science and Engineering, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China lihuaping@tju.edu.cn 
Cong-hua Lu School of Materials Science and Engineering, Tianjin University, Tianjin 300072, China chlu@tju.edu.cn 
Xue-hao He Department of Chemistry, School of Science, Tianjin University, and Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China xhhe@tju.edu.cn 
Abstract:
Numerous theoretical and experimental efforts have been made to explain the dependence of the static wrinkling morphology on the materials' physical properties, whereas the dynamic wrinkling process remains elusive. In the present work, we design a wrinkling model consisting of a soft substrate and a graphene-like rigid thin film to investigate this dynamic process. The simulation shows that the whole wrinkling process includes three stages. At the incubation and wrinkling stages, the stress along the horizon direction of the soft substrate transfers to the stiff film. However, at the equilibrium stage, the stress of the rigid film slowly transfers back to the substrate although the total energy still decreases. It is found that the stress of the substrate concentrates at the top surface, especially at the trough, whereas the stress distribution of the film depends on direction. In the perpendicular direction, the stress at the wave's equilibrium position surpasses that at the crest and trough and, oppositely, the stress concentrates at the crest and trough in the horizon direction. Present model reproduces both wrinkling and delamination patterns and can be a powerful tool to deeply understand the structure deformation of material induced by stress release.
Key words:  Wrinkle  Delamination  Stress distribution  Particle model
FundProject:This work was supported by the High Performance Computing Center of Tianjin University, China and the National Natural Science Foundation of China (No.91127046, No.21274107, and No.21474075).
弹性基底表面薄膜起皱的计算机模拟
吕倩茹,李华平,鲁从华,何学浩
摘要:
本文设计了一种起皱模型用以研究起皱现象的动态过程.模拟表明整个起皱过程包括三个阶段.在孵化和起皱阶段,水平方向上软基底的应力在回缩过程中传递给硬膜.而在构象松弛平衡阶段,硬膜上的应力又缓慢地传回给软基底,整个起皱过程体系的总能量持续下降.研究发现起皱后软基底上的应力集中在上表层,尤其是在波谷处.而硬膜上的应力分布则取决于方向,在垂直方向,平衡位置的应力要大于波峰和波谷处,与此相反,在水平方向应力则更集中于波峰和波谷.我们的模型既能重现起皱现象,又能重现起皮现象,为材料应力释放导致的结构失稳机理研究提供了一个非常有利的工具.
关键词:  起皱  起皮  应力分布  粒子模型
DOI:10.1063/1674-0068/29/cjcp1512254
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