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Microstructure of PMMA/SiO2 Hybrid Material Fabricated by Micromolding
Liu Jianping,Guo Bin,He Pingsheng*,Zhang Qijin
Author NameAffiliationE-mail
Liu Jianping Department of Polymer Science and TechnologyUniversity of Science and Technology of ChinaHefei 230026Science InstituteEast China Jiaotong UniversityNanchang 330013  
Guo Bin Department of Polymer Science and TechnologyUniversity of Science and Technology of ChinaHefei 230026  
He Pingsheng* Department of Polymer Science and TechnologyUniversity of Science and Technology of ChinaHefei 230026 hpsm@ustc.edu.cn 
Zhang Qijin Department of Polymer Science and TechnologyUniversity of Science and Technology of ChinaHefei 230026  
Abstract:
PMMA/ SiO2 organic-inorganic hybrid sol was synthesized by monomer methyl methacrylate,3-(triethoxysilyl)propylmethacrylate(mol ration is 1: 1),0.2%(total weight of monomers)initiator azodiisobutyronitrile,solvent tetrahydrofuran and 20%(total weight of the system)tetraethylorthosilicate. PDMS stamp with micropatterns was placed on the hybrid sol film prepared by spin-coating on the clean glass slides. Heat treatment under 120℃ for 2 h with a weak pressure of 1 N makes the sol convert to gel. PMMA/SiO2 hybrid material micropatterns remain on the substrate after being peeled off the stamp. Optical microscope images show stringent pattern fidelity using the micromolding method which also indicates the further application in the micropatterns fabrication.
Key words:  Soft lithography,Micromolding,PMMA/ SiO2,Hybrid
FundProject:
微模塑法制备PMMA/SiO2二氧化硅杂化材料微结构
刘建平,郭斌,何平笙*,张其锦
摘要:
以摩尔比为1:1的甲基丙烯酸甲酯(MMA)、甲基丙烯酸(3-三乙氧基硅烷基)丙酯(ESMA)单体、 0.2%(单体总量的质量分数)的偶氮二异丁腈AIBN引发剂和四氢呋喃(THF)溶剂,及20%(总质量分数)的正硅酸乙酯TEOS合成出PMMA/SiO2有机-无机杂化的杂化溶胶.将溶胶在洗净的普通光学玻璃基片表面甩膜.利用软刻蚀中的微模塑法,把有机硅弹性印章复制有精细图纹一面轻放在杂化溶胶膜上进行微模塑,外加1 N压力于120℃下处理2 h使溶胶凝胶化.印章剥离后在基片表面就形成了PMMA/SiO2有机-无机杂化材料的微图纹结构.从微图纹的光学显微镜照片可以看出微模塑方法制备杂化材料复制的图纹精细度高,操作简单易行,是一类比较理想的微细图纹结构加工的方法.
关键词:  软刻蚀  微模塑  PMMA/SiO2  杂化
DOI:10.1088/1674-0068/17/6/779-782
分类号: