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Study of Thin Poly-hexamethyladisiloxane Films Deposited with R.f.Plasma with XPS
Qi Shangkui,LüJinjun,Zhang Pingyu,Yang Shengrong,Wang Yunfei,Wang Jingyi
Author NameAffiliation
Qi Shangkui State Key Laboratory of Solid Lubrication of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 
LüJinjun State Key Laboratory of Solid Lubrication of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 
Zhang Pingyu State Key Laboratory of Solid Lubrication of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 
Yang Shengrong State Key Laboratory of Solid Lubrication of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000 
Wang Yunfei Lanzhou Physics Institute of China, Lanzhou 730000 
Wang Jingyi Lanzhou Physics Institute of China, Lanzhou 730000 
Abstract:
Thin poly-hexamethyladisiloxane films on deposited polyster film substrate were successfully prepared with CVD method in a R.F. plasma polymerizing apparatus. Elemental oxygen erosion resistance of the films was measured in an equipment simulated the elemental oxygen environments and the property was good. The films can protect the material surface of the apparatus in space. Property of the films related to the loss of oxygen in the film preparation and deposited density of the films that was tested by AFM was not uniform. Functional groups structure and surface chemical state of the films, which were prepared under different processing parameters were investigated by using XPS in present work in order to obtain films that had good elemental oxygen erosion resistance
Key words:  Elemental oxygen, CVD, Poly-hexamethyladisiloxane film, XPS
FundProject:
射频等离子沉积聚硅氧烷薄膜的XPS研究
齐尚奎,吕晋军,张平余,杨生荣,王云飞,王敬宜
摘要:
用CVD方法在一台射频放电等离子体聚合实验装置内成功地制备了沉积聚酯薄膜基底有机聚硅氧烷薄膜.该薄膜在有原子氧模拟实验装置内具有抗原子氧剥蚀的良好性能,对航天器等材料表面起到防护作用.有机聚硅氧烷薄膜与等离子体沉积时氧的泄露量有关,且沉积密度经AFM检测有较大的差异.并用XPS较详细考察了不同工艺制备的聚硅氧烷官能团构成和表面状态,以期得到优良的防剥蚀膜.
关键词:  原子氧  CVD  有机聚硅氧烷  XPS
DOI:10.1088/1674-0068/14/4/459-464
分类号: