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Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method
Li-qiu Shi*,Lin Zhang,Feng Yu,Yong-da Yan,Tao Sun,Shen Dong
Author NameAffiliationE-mail
Li-qiu Shi* College of Mechanical Engineering, Jiamusi University, Jiamusi 154007, China jmsdxshiliqiu@163.com 
Lin Zhang College of Mechanical Engineering, Jiamusi University, Jiamusi 154007, China  
Feng Yu College of Mechanical Engineering, Jiamusi University, Jiamusi 154007, China  
Yong-da Yan Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001, China  
Tao Sun Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001, China  
Shen Dong Center for Precision Engineering, Harbin Institute of Technology, Harbin 150001, China  
Abstract:
Functionalizing and patterning of the silicon surface can be realized simultaneously by the chemomechanical method. The oxide-coated crystalline silicon (100) surface is scratched with a diamond tool in the presence of aryldiazonium salt (C6H5N2BF4). Scratching activates the silicon surface by removing the passivation oxide layer to expose fresh Si atoms. The sur-face morphologies before and after chemomechanical reaction are characterized with atomic force microscopy. Time-of-flight secondary ion mass spectroscopy confirms the presence of C6H5 and provides evidence for the formation of self-assembled monolayer (SAM) on silicon surface via Si-C covalent bonds by scratching the silicon in the presence of C6H5N2BF4. C6H5 groups further bond with surface Si atoms via Si-C covalent bonds as confirmed from infrared spectroscopy results. We propose that chemomechanical reaction, which occurred during scratching the silicon surface, produce C6H5 groups from aryldiazonium salt. The rel-evant adhesion of SAM is measured. It is found that SAM can reduce the adhesion of silicon. The monolayer can be used as anti-adhesion monolayer for micro/nanoelectromechanical sys-tems components under different environments and operating conditions.
Key words:  Chemomechanical, Silicon, Monolayer, Aryldiazonium salt
FundProject:
机械-化学方法在硅(100)表面制备芳香烃重氮盐单层膜
史立秋*,张林,于峰,闫永达,孙涛,董申
摘要:
利用机械-化学方法同时实现硅表面的图形化和功能化. 在芳香烃重氮盐(C6H5N2BF4)中用金刚石刀具刻划单晶硅(100),使单晶硅表面的Si-O键断裂,形成硅的自由基,进而它们与溶液中含有的有机分子共价结合以形成自组装单层膜. 用原子力显微镜对自组装前后的表面形貌进行表征,用飞行时间二次离子质谱和红外光谱对自组装单层膜进行检测和分析,通过确认C6H5离子的存在证明自组装单层
关键词:  机械-化学方法,硅,单层,芳香烃重
DOI:10.1088/1674-0068/24/06/741-744
分类号: