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Preparation and Refractive Index of Nano BST Thin Films
Song-zhan Li*1, Yan-qin Yang1, Wen-cong Liu1, Tian-jin Zhang2, Ya-jun Qi2
1.College of Electronics and Information Engineering, Wuhan University of Science and Engineering, Wuhan 430073, China;2.Department of Materials Science and Engineering, Hubei University, Wuhan 430062, China
Abstract:
"Radio frequency magnetron sputtering technique is used to deposit Ba0:65Sr0:35TiO3 (BST) thin films on fused quartz substrates. In order to prepare the high quality BST thin films, the crystallization and microstructure of the films were characterized by X-ray diffraction, field emission scanning electron microscopy and atom force microstructure. The more intense characteristic diffraction peaks and better crystallization can be observed in BST thin films deposited at 600 oC and subsequently annealed at 700 oC. The refractive index of the films is determined from the measured transmission spectra. The dependences of the refractive index on the deposition parameters of BST thin films are different. The refractive index of the films increases with the substrate temperature. At lower sputtering pressure, the refractive index increases from 1.797 to 2.179 with the pressure increase. However, when the pressure increases up to 3.9 Pa, the refractive index instead reduces to 1.860. The oxygen to argon ratio also plays an important effect on the refractive index of the films. It has been found that the refractive index increases with the ratio of oxygen to argon increasing. The refractive index of BST thin films is strongly dependent on the annealing temperature, which also increases as the annealing temperature ascends. In one word, the refractive index of BST thin films is finally affected by the films microstructure and texture."
Key words:  BST thin film, Radio frequency magnetron sputtering, Deposition parameter, Refractive index
FundProject:
纳米BST薄膜的制备及其折射率特性.
李颂战*1, 杨艳芹1, 刘文琮1, 章天金2, 祁亚军2
1.武汉科技学院电子信息工程学院,武汉430073;2.湖北大学材料科学与工程学院,武汉430062
摘要:
" 采用射频磁控溅射法在石英衬底上沉积了纳米BST(Ba0:65Sr0:35TiO3)薄膜.为了制备优质的BST薄膜,借助X射线衍射仪、场发射扫描电镜和原子力显微镜研究了BST薄膜的晶化行为和显微结构.结果显示在衬底温度600 ℃下制备的BST薄膜经700 ℃退火处理后,具有较强的特征衍射峰和极好的晶化.同时还研究了纳米BST薄膜的制备参数和特性,BST薄膜的折射率是由测量的透射谱中获得的.实验结果表明:纳米BST薄膜的沉积参数对其折射率特性的影响是不尽相同的.折射率随着衬底温度的上升而增加;在较低的溅射
关键词:  射频磁控溅射,BST薄膜,溅射参数,折射率
DOI:10.1088/1674-0068/20/06/706-710
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