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Surface Formation of Single Silicon Wafer Polished with Nano-sized Al2O3 Powders
Yu-li Sun, Dun-wen Zuo*, Yong-wei Zhu, Min Wang
College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China
Abstract:
"Ice polishing single silicon wafers with nano-sized Al2O3 abrasives can be known as ice fixed abrasives chemical mechanical polishing (IFA-CMP). TAn abrasive slurry was made of nano-sized Al2O3 particles dispersed in de-ionized water with a surfactant and the slurry was frozen to form an ice polishing pad. Then polishing tests of blanket silicon wafers with the above ice polishing pad were carried out. The morphologies and surface roughness of the polished silicon wafers were observed and examined on an atomic force microscope. The subsurface damage was assessed by means of cross-section transmission electron microscopy. The surface chemical constituents of the polished silicon wafers were characterized using X-ray photoelectron spectroscopy in order to gain insight into the chemical mechanisms in the process. Scratch resistance of the single silicon wafer was measured by nanoscratching using a nanoindenter to explore the mechanical removal mechanism. The results show that a super smooth surface with an average roughness of 0.367 nm is obtained within 1000 nm£1000 nm and there is a perfect silicon diamond structure without any microcracks in the subsurface. The removal of material is dominated by the coactions of ductile regime machining and chemical corrosion. In the end, a model of material removal of IFA-CMP is built."
Key words:  Single silicon wafer, Nano-sized Al2O3, Ice fixed abrasives CMP, Nanoscratch, Ductile regime machining
FundProject:
纳米α-Al2O3磨料抛光单晶硅片光滑表面的形成机理
孙玉利, 左敦稳*, 朱永伟, 王珉
南京航空航天大学机电学院,南京210016
摘要:
"将纳米α-Al2O3粉体配制成抛光液并冷冻成冰结抛光垫对单晶硅片进行了抛光,用原子力显微镜观察了抛光表面的微观形貌并测量了其表面粗糙度,采用透射电镜观察了单晶硅片抛光后的断面形貌.为进一步分析抛光过程中的化学作用机理,采用X射线光电子能谱分析了单晶硅片抛光后表面的化学成分.利用纳米压痕仪的划痕附件对单晶硅片进行了划痕测试,研究了抛光过程中的机械作用机理.结果表明纳米α-Al2O3磨料冰冻抛光单晶硅片时,在1 mm£1 mm的范围内得到了微观表面粗糙度为0.367 nm的超光滑表面,亚表面没有任何损伤,材
关键词:  单晶硅片,纳米α-Al2O3磨料,冰冻固结磨料化学机械抛光,纳米划痕,塑性域加工
DOI:10.1088/1674-0068/20/06/643-648
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