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在193 nm关于Si2分子的离子解离动力学的成像研究
马玉杰,李芳芳,刘嘉兴,王凤燕*
作者单位E-mail
马玉杰 复旦大学化学系上海市分子催化和功能材料重点实验室能源材料化学协同创新中心上海 200438  
李芳芳 复旦大学化学系上海市分子催化和功能材料重点实验室能源材料化学协同创新中心上海 200438  
刘嘉兴 复旦大学化学系上海市分子催化和功能材料重点实验室能源材料化学协同创新中心上海 200438  
王凤燕* 复旦大学化学系上海市分子催化和功能材料重点实验室能源材料化学协同创新中心上海 200438 fengyanwang@fudan.edu.cn 
摘要:
在193 nm的单色激光实验中,本文利用时间切片离子速度成像技术,研究了经193 nm双光子电离得到的Si2+的解离反应动力学过程. 根据实验得到的Si+离子的速度成像,观测到了两种离子直接解离通道:Si(3Pg)+Si+(2Pu)和Si(1D2)+Si+(2Pu). 电子基态的Si2分子处于v=0∽5的振动态上,其经过双光子电离后激发到Si2+离子的多个电子激发态势能面,生成主要通道Si(3Pg)+Si+(2Pu),其中v=1的解离信号最强. 此外,由于势能曲线22Πg与32Πg相同对称性引起的避免性势能面交叉,生成次要反应通道Si(1D2)+Si+(2Pu). 通道Si(1D2)+Si+(2Pu)的产物亦可以由生成的基态Si2+(X4Σg-)吸收一个193 nm光子后解离得到,其对应产物则具有更大的动能.
关键词:  切片成像,光解动力学,硅二聚体,193 nm
DOI:10.1063/1674-0068/cjcp1901011
分类号:
基金项目:
Imaging the Dissociation Dynamics of Si2+ via Two-Photon Excitation at 193 nm
Yu-jie Ma,Fang-fang Li,Jia-xing Liu,Feng-yan Wang*
Abstract:
In the one-color experiment at 193 nm, we studied the photodissociation of Si2+ ions prepared by two-photon ionization using the time-sliced ion velocity map imaging method. The Si+ imaging study shows that Si2+ dissociation results in two distinct channels: Si(3Pg)+Si+(2Pu) and Si(1D2)+Si+(2Pu). The main channel Si(3Pg)+Si+(2Pu)) is produced by the dissociation of the Si2+ ions in more than one energetically available excited electronic state, which are from the ionization of Si2(v=0-5). Particularly, the dissociation from the vibrationally excited Si2(v=1) shows the strongest signal. In contrast, the minor Si(1D2)+Si+(2Pu) channel is due to an avoided crossing between the two 22Πg states in the same symmetry. It has also been observed the one-photon dissociation of Si2+(X4Σg-) into Si(1D2)+Si+(2Pu) products with a large kinetic energy release.
Key words:  Slice imaging, Photodissociation, Silicon dimmer Si2, 193 nm