Li-qiu Shi, Lin Zhang, Feng Yu, Yong-da Yan, Tao Sun, Shen Dong. Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method[J]. Chinese Journal of Chemical Physics , 2011, 24(6): 741-744. doi: 10.1088/1674-0068/24/06/741-744
Citation: Li-qiu Shi, Lin Zhang, Feng Yu, Yong-da Yan, Tao Sun, Shen Dong. Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method[J]. Chinese Journal of Chemical Physics , 2011, 24(6): 741-744. doi: 10.1088/1674-0068/24/06/741-744

Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method

doi: 10.1088/1674-0068/24/06/741-744
Funds:  We thank Prof. Yang Gan of Harbin Institute of Technology, and Prof. Fu-long Yuan of Heilongjiang University for the help in the experiments. This work was supported by the Center for Precision Engineeringof Harbin Institute of Technology, the Youth the Col-leges and Universities in Heilongjiang Province in 2010 (No.1155G54), the Training Fund Project of Jiamusi University (No.RC2009-037), and the National NaturalScience Foundation of China (No.51105174).
  • Received Date: 2011-05-30
  • Functionalizing and patterning of the silicon surface can be realized simultaneously by the chemomechanical method. The oxide-coated crystalline silicon (100) surface is scratched with a diamond tool in the presence of aryldiazonium salt (C6H5N2BF4). Scratching activates the silicon surface by removing the passivation oxide layer to expose fresh Si atoms. The sur-face morphologies before and after chemomechanical reaction are characterized with atomic force microscopy. Time-of-flight secondary ion mass spectroscopy confirms the presence of C6H5 and provides evidence for the formation of self-assembled monolayer (SAM) on silicon surface via Si-C covalent bonds by scratching the silicon in the presence of C6H5N2BF4. C6H5 groups further bond with surface Si atoms via Si-C covalent bonds as confirmed from infrared spectroscopy results. We propose that chemomechanical reaction, which occurred during scratching the silicon surface, produce C6H5 groups from aryldiazonium salt. The rel-evant adhesion of SAM is measured. It is found that SAM can reduce the adhesion of silicon. The monolayer can be used as anti-adhesion monolayer for micro/nanoelectromechanical sys-tems components under different environments and operating conditions.
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Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method

doi: 10.1088/1674-0068/24/06/741-744
Funds:  We thank Prof. Yang Gan of Harbin Institute of Technology, and Prof. Fu-long Yuan of Heilongjiang University for the help in the experiments. This work was supported by the Center for Precision Engineeringof Harbin Institute of Technology, the Youth the Col-leges and Universities in Heilongjiang Province in 2010 (No.1155G54), the Training Fund Project of Jiamusi University (No.RC2009-037), and the National NaturalScience Foundation of China (No.51105174).

Abstract: Functionalizing and patterning of the silicon surface can be realized simultaneously by the chemomechanical method. The oxide-coated crystalline silicon (100) surface is scratched with a diamond tool in the presence of aryldiazonium salt (C6H5N2BF4). Scratching activates the silicon surface by removing the passivation oxide layer to expose fresh Si atoms. The sur-face morphologies before and after chemomechanical reaction are characterized with atomic force microscopy. Time-of-flight secondary ion mass spectroscopy confirms the presence of C6H5 and provides evidence for the formation of self-assembled monolayer (SAM) on silicon surface via Si-C covalent bonds by scratching the silicon in the presence of C6H5N2BF4. C6H5 groups further bond with surface Si atoms via Si-C covalent bonds as confirmed from infrared spectroscopy results. We propose that chemomechanical reaction, which occurred during scratching the silicon surface, produce C6H5 groups from aryldiazonium salt. The rel-evant adhesion of SAM is measured. It is found that SAM can reduce the adhesion of silicon. The monolayer can be used as anti-adhesion monolayer for micro/nanoelectromechanical sys-tems components under different environments and operating conditions.

Li-qiu Shi, Lin Zhang, Feng Yu, Yong-da Yan, Tao Sun, Shen Dong. Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method[J]. Chinese Journal of Chemical Physics , 2011, 24(6): 741-744. doi: 10.1088/1674-0068/24/06/741-744
Citation: Li-qiu Shi, Lin Zhang, Feng Yu, Yong-da Yan, Tao Sun, Shen Dong. Preparation of Aryldiazonium Salt Monolayers on Si(100) Surface by Chemomechanical Method[J]. Chinese Journal of Chemical Physics , 2011, 24(6): 741-744. doi: 10.1088/1674-0068/24/06/741-744

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