Microstructure of PMMA/SiO2 Hybrid Material Fabricated by Micromolding
- Received Date: 2003-07-10
- Soft lithography，Micromolding，PMMA/ SiO2，Hybrid /
Abstract: PMMA/ SiO2 organic-inorganic hybrid sol was synthesized by monomer methyl methacrylate，3-（triethoxysilyl）propylmethacrylate（mol ration is 1: 1），0.2%（total weight of monomers）initiator azodiisobutyronitrile，solvent tetrahydrofuran and 20%（total weight of the system）tetraethylorthosilicate. PDMS stamp with micropatterns was placed on the hybrid sol film prepared by spin-coating on the clean glass slides. Heat treatment under 120℃ for 2 h with a weak pressure of 1 N makes the sol convert to gel. PMMA/SiO2 hybrid material micropatterns remain on the substrate after being peeled off the stamp. Optical microscope images show stringent pattern fidelity using the micromolding method which also indicates the further application in the micropatterns fabrication.
|Citation:||Liu Jianping, Guo Bin, He Pingsheng, Zhang Qijin. Microstructure of PMMA/SiO2 Hybrid Material Fabricated by Micromolding[J]. Chinese Journal of Chemical Physics , 2004, 17(6): 779-782. doi: 10.1088/1674-0068/17/6/779-782|