Preperation of PbS/poly(acrylic acid) Nanocrystal Micropatterns by Soft Lithography
- Received Date: 2003-03-18
Abstract: PbS microstructures have several applications such as Pb2+ion-selective sensors and IR detector.The method to prepare PbS nanocrystal embed in poly(acrylicacid) (PAA) microstructures produced by means of soft lithography and solid state polymerizatio n by γ-ray irradiation was described. PbS micro patterns were prepared by Micro molding in Capillaries (MIMIC) with aqueous solution of acrylic acid lead monomer, and then solid state polymerized by γ-ray irradiation. Finally, the sample was treated with aqueous solution of Na2 Stoconvert the Pb2+ to PbS in the matrix. High-resolution micro structures of PAA, which have PbS nanocrystals embedded in them, could be produced successfully in this way. The final products were characterized by TEM, XRD, and XPS. TEM image indicated that the PbS particles embedded in PAA had a diameter of smaller than 20nm. X-ray powder diffraction method was also used to characterize the PbS/PAA nanocomposite film. The XPS analysis showed the element Pb has been converted to PbS nanoparticles in the composite films.
|Citation:||Wu Xiaosong, Pan Lijia, Zou Gang, Liu Jianping, He Pingsheng. Preperation of PbS/poly(acrylic acid) Nanocrystal Micropatterns by Soft Lithography[J]. Chinese Journal of Chemical Physics , 2004, 17(5): 641-644. doi: 10.1088/1674-0068/17/5/641-644|