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    Ji Hang, Zhao Texiu, Xu Pengshou, Wang Xiaoping, Wu Jianxin, Lu Erdong, Xu Zhenjia. Synchrotron Radiation Photoemission Study of Chemisorption and Interaction at the K/InP(100) Interface[J]. Chinese Journal of Chemical Physics , 1995, 8(3): 263-268.
    Citation: Ji Hang, Zhao Texiu, Xu Pengshou, Wang Xiaoping, Wu Jianxin, Lu Erdong, Xu Zhenjia. Synchrotron Radiation Photoemission Study of Chemisorption and Interaction at the K/InP(100) Interface[J]. Chinese Journal of Chemical Physics , 1995, 8(3): 263-268.

    Synchrotron Radiation Photoemission Study of Chemisorption and Interaction at the K/InP(100) Interface

    • The room temperature adsorption of K on p-type InP(100) has been studied with use of synchrotron radiation core-level spectroscopy. From the coverage dependent In 4d and P 2p core-level spectra, we found that in the process or K adsorption on InP(100), the reaction between K and P is observed and K-P compound is formed. When the K coverage 0 > 210 Sec.,the stable K-P compound is formed. Meanwhile, the peak position and peak shape of P 2p shows no change. No reaction occurs between K and In, and in the process of K adsorption on InP(100) surface, the in of substrate is exchanged into surface by K. The K adsorption leads to band bending: The empty state of dangling bond of in (exchanged by K) was filled by the our-shell electrons of K, formed a half-filled surface state. The fermi-level shift and pinning was caused by this half-filled surface state.
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