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    Yang Feng, Yan Xiaoci, Ouyang Li, Wang Liya, Luo Mingdao, Wang Tianzhi, Qu Songsheng. The Improred Valence Connectivity Topological Index and Its Application δi- Comparison with δv in QSAR/QSPR of Three Systems[J]. Chinese Journal of Chemical Physics , 1998, 11(3): 221-226.
    Citation: Yang Feng, Yan Xiaoci, Ouyang Li, Wang Liya, Luo Mingdao, Wang Tianzhi, Qu Songsheng. The Improred Valence Connectivity Topological Index and Its Application δi- Comparison with δv in QSAR/QSPR of Three Systems[J]. Chinese Journal of Chemical Physics , 1998, 11(3): 221-226.

    The Improred Valence Connectivity Topological Index and Its Application δi- Comparison with δv in QSAR/QSPR of Three Systems

    • The valence connection index δv is not suitable for the inorganic compounds which have complicated oxidation state (for example,Si+,Si2+, Si3+, Si4+ ) and the organic compounds which include many sorts of heteroatoms such as F,Cl,Br,I,O,S,etc.,in order to enlarge the field of δv, on the basis of δv, we defined the valence connection index δi- by introducing the main quantum number,the number of valence electrons to the atom under study.The improved molecular topological index 1X- was defined by means of δi- .The X0- of SiXnn =1~4,X=F,Cl,Br,I),the 1X- of ClmSi(OR)nm+n =4) and halogeno-benzene were calculated.The linear relations of X0- and the ΔfHm of SIXn, 1X- and the GC retention index (RI) of ClmSi(OR)n, 1X- and the solubility S and the distribution coefficient P (octanol/water) of halogeno-benzene are good,their correlation coeficients R are 0.9928,0.97,0.9694,0.9929,respectively.The results are much better than those of the topological indicex X0v and Xv which are formed by δv (the correlation coefficients are 0.8862,0.70,0.9131,0.9387,correspondingly).
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