The Effect of Substrate Temperature on Deposition of Carbon Nitride Thin Films

Carbon nitride thin films have been deposited by radio frequency sputtering at different substrate temperature. The electron structure and optical properties of the carbon nitride thin films have been systematically studied as a function of the substrate temperature. The chemical structure and composition of the films were characterized by Fourier transform infrared spectroscopy （FTIR）and X-ray photoelectron spectroscopy （XPS）. The optical properties of the films were evaluated using transmission ultraviolet-visible-near infrared （UV） spectroscopy .The maximum N atom concentration in the Films arrived at 0.4. The binding energy （BE） of core level Cls and Nls produces a large shift in range of 4.41~0.3 eV depended on substrate temperature Ts. Both N atom concentration and shift of BE of core leve are decreased with T^s increasing. It illustrates that raisingh T^s is not a good way to form carbon nitride films. UV spectra shows that the films have a good transparency in near infrared region, but there is a sharp absorption peak around 2720nm. The peak disappears when T^s is higher than 400 ℃. These results may be meaning for infrared application as a protective optical coating.