Advanced Search
    Dai Guoliang, Wang Yongcheng, Geng Zhiyuan, Lü Lingling, Wang Dongmei. Theoretical Study on Reaction of SiH3 with NO2[J]. Chinese Journal of Chemical Physics , 2005, 18(4): 522-526. DOI: 10.1088/1674-0068/18/4/522-526
    Citation: Dai Guoliang, Wang Yongcheng, Geng Zhiyuan, Lü Lingling, Wang Dongmei. Theoretical Study on Reaction of SiH3 with NO2[J]. Chinese Journal of Chemical Physics , 2005, 18(4): 522-526. DOI: 10.1088/1674-0068/18/4/522-526

    Theoretical Study on Reaction of SiH3 with NO2

    • The reaction between silyl radicals and nitric oxide was studied by using the B3LYP/6311G and the high-level electron-correlation CCSD(T)/6-311G methods. The geometries for reactants, the transition states and the products were completely optimized. All the transition states are verified by the vibrational analysis and the intrinsic reaction coordinate (IRC) calculations. The results show that the reaction is via multi-channel and multi-step. Five products may be formed via the complex reaction channels, i.e. association, H-shift and dissociation.
    • loading

    Catalog

      /

      DownLoad:  Full-Size Img  PowerPoint
      Return
      Return