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    Yang Wei, Li Guang, Li Xiaoguang, Xie Jiachun, Xu Jun. Current Transport Under High Magnetic Fields in Ni/4H-SiC Schottky Barrier[J]. Chinese Journal of Chemical Physics , 2004, 17(4): 449-453. DOI: 10.1088/1674-0068/17/4/449-453
    Citation: Yang Wei, Li Guang, Li Xiaoguang, Xie Jiachun, Xu Jun. Current Transport Under High Magnetic Fields in Ni/4H-SiC Schottky Barrier[J]. Chinese Journal of Chemical Physics , 2004, 17(4): 449-453. DOI: 10.1088/1674-0068/17/4/449-453

    Current Transport Under High Magnetic Fields in Ni/4H-SiC Schottky Barrier

    • Ni/4H-SiC Schottky contacts with good characteristics were fabricated using electron beam evaporation to deposit Ni on 4H-SiC((0001)Si face). Current-voltage(I-V)characteristics of Ni / 4H-SiC Schottky barrier have been studied in the temperature range from 160 K to 300 K in magnetic fields(B)up to 10 T. The thermionic emission theory and relaxation time approximation Boltzmann eqation were employed to calculate the I - V characteristics,and it is found that the change of current shows a linear relation with B2 and V,and is inversely proportional to the temperature,which well agrees with experimental results.
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