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    Shuze Ma, Feiyue Zhou, Ge Sun, Chunlei Xiao, Wenrui Dong, Hongwei Li, Xueming Yang. Collision-Induced Relaxation of CH(X2Π, υ=0) Radical by He, Ar, and N2 under Low-Temperature Supersonic Flow Condition[J]. Chinese Journal of Chemical Physics . DOI: 10.1063/1674-0068/cjcp2407095
    Citation: Shuze Ma, Feiyue Zhou, Ge Sun, Chunlei Xiao, Wenrui Dong, Hongwei Li, Xueming Yang. Collision-Induced Relaxation of CH(X2Π, υ=0) Radical by He, Ar, and N2 under Low-Temperature Supersonic Flow Condition[J]. Chinese Journal of Chemical Physics . DOI: 10.1063/1674-0068/cjcp2407095

    Collision-Induced Relaxation of CH(X2Π, υ=0) Radical by He, Ar, and N2 under Low-Temperature Supersonic Flow Condition

    • Collision-induced relaxation process of CH(X2Π, v=0) radical in various bath gases He, Ar, and N2 has been investigated experimentally under low-temperature (26– 52 K) supersonic flow conditions. The CH radicals were generated with internal excitation by multiphoton photolysis of CHBr3 at 248 nm, and its rotational temperature was found to relax to the flow temperature in a few microseconds by colliding with bath gas. The relaxation rate coefficients for CH(X2Π, v=0) radical in He, Ar, and N2 flow were obtained by time-resolved laser-induced fluorescence measurements, ranging from 10−12 cm3·molecule−1·s−1 to 10−11 cm3·molecule−1·s−1. The N2 flow exhibits the highest relaxation rate for CH(X2Π) radical due to its additional rovibrational levels, which allow for more efficient energy dissipation during collisions compared to monoatomic gases. The Ar flow shows a larger relaxation rate than He flow due to its greater polarizability and stronger long-range interaction with the CH(X2Π) radical.
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