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    Shaowen Feng, Zhen Li, Wenli Liu, Qiang Zhang, Yang Chen, Dongfeng Zhao. A Plasma Injection Ion Source for Photoelectron Imaging of Metal-Containing Anions[J]. Chinese Journal of Chemical Physics . DOI: 10.1063/1674-0068/cjcp2310106
    Citation: Shaowen Feng, Zhen Li, Wenli Liu, Qiang Zhang, Yang Chen, Dongfeng Zhao. A Plasma Injection Ion Source for Photoelectron Imaging of Metal-Containing Anions[J]. Chinese Journal of Chemical Physics . DOI: 10.1063/1674-0068/cjcp2310106

    A Plasma Injection Ion Source for Photoelectron Imaging of Metal-Containing Anions

    • A plasma injection ion source has been developed for the photoelectron velocity imaging studies of metal-containing anions. The source employs a pulse discharge nozzle for generating a plasma beam that perpendicularly crosses the master supersonic jet beam from a home-made pulsed piezo valve. The discharge nozzle is designed for high voltage gas discharge with efficient metal sputtering of the cathode, and thus plays a role in metal atom and ion source. Supersonically jet-cooled anions can be produced in the master gas jet via reactions of the plasma products. The source is integrated into a photoelectron velocity imaging spectrometer. Test mass spectrometry experiments show that the ion source can efficiently produce transition metal containing anions, such as FeOm, CuOm, CuCn, CuCnOm. The photoelectron imaging results by photodetachment of O show that the photoelectron energy resolution of the whole instrument is ΔE/E≈2.3%, and the results of FeO indicate that internal temperatures of anions from the source could be efficiently cooled down.
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