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    Yu-jie Ma, Fang-fang Li, Jia-xing Liu, Feng-yan Wang. Imaging the Dissociation Dynamics of Si2+ via Two-Photon Excitation at 193 nm[J]. Chinese Journal of Chemical Physics , 2019, 32(1): 129-133. DOI: 10.1063/1674-0068/cjcp1901011
    Citation: Yu-jie Ma, Fang-fang Li, Jia-xing Liu, Feng-yan Wang. Imaging the Dissociation Dynamics of Si2+ via Two-Photon Excitation at 193 nm[J]. Chinese Journal of Chemical Physics , 2019, 32(1): 129-133. DOI: 10.1063/1674-0068/cjcp1901011

    Imaging the Dissociation Dynamics of Si2+ via Two-Photon Excitation at 193 nm

    • In the one-color experiment at 193 nm, we studied the photodissociation of Si2+ ions prepared by two-photon ionization using the time-sliced ion velocity map imaging method. The Si+ imaging study shows that Si2+ dissociation results in two distinct channels: Si(3Pg)+Si+(2Pu) and Si(1D2)+Si+(2Pu). The main channel Si(3Pg)+Si+(2Pu)) is produced by the dissociation of the Si2+ ions in more than one energetically available excited electronic state, which are from the ionization of Si2(v=0-5). Particularly, the dissociation from the vibrationally excited Si2(v=1) shows the strongest signal. In contrast, the minor Si(1D2)+Si+(2Pu) channel is due to an avoided crossing between the two 22Πg states in the same symmetry. It has also been observed the one-photon dissociation of Si2+(X4Σg-) into Si(1D2)+Si+(2Pu) products with a large kinetic energy release.
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